Plasma information-based virtual metrology (PI-VM) and mass production process control
Autor: | Seolhye Park, Jaegu Seong, Yunchang Jang, Hyun-Joon Roh, Ji-Won Kwon, Jinyoung Lee, Sangwon Ryu, Jaemin Song, Ki-Baek Roh, Yeongil Noh, Yoona Park, Yongsuk Jang, Taeyoung Cho, Jae-Ho Yang, Gon-Ho Kim |
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Rok vydání: | 2022 |
Předmět: | |
Zdroj: | Journal of the Korean Physical Society. 80:647-669 |
ISSN: | 1976-8524 0374-4884 |
Databáze: | OpenAIRE |
Externí odkaz: |