Patterning colloidal nanotopographies
| Autor: | M.A. Wood, Mathis O. Riehle, C. D. W. Wilkinson |
|---|---|
| Rok vydání: | 2002 |
| Předmět: |
Materials science
Silicon Mechanical Engineering digestive oral and skin physiology technology industry and agriculture chemistry.chemical_element Bioengineering Nanotechnology General Chemistry Substrate (printing) engineering.material complex mixtures law.invention Coating chemistry Resist Mechanics of Materials law engineering General Materials Science Dry etching Electrical and Electronic Engineering Photolithography Lithography Nanoscopic scale |
| Zdroj: | Nanotechnology. 13:605-609 |
| ISSN: | 0957-4484 |
| DOI: | 10.1088/0957-4484/13/5/312 |
| Popis: | Creating a device where cell reactions to nanoscale topographies and a control (usually planar) surface can be monitored simultaneously is advantageous from a biological perspective. Through the utilization of both natural lithography and conventional photolithography techniques, it has been possible to create a structure where planar and nanopillared surfaces lie collaterally on one device. By patterning an optical resist, exposing this to the desired mask pattern, developing and coating in poly-L-lysine, a surface adhesive to gold colloidal particles is presented. Following immersion in a colloidal sol, in this case a 20 nm diameter gold colloidal sol, colloids adhere to the poly-L-lysine across the primed surface. In a subsequent dry etch step, the colloids that are present where the resist has been removed act as an etch mask, resulting in pillars being etched into the surface of a base substrate, in this instance either silicon or quartz. By removing the resist and also the colloids, a device results where planar and nanopillared areas lie collaterally. This allows cell reactions on the two surfaces to be monitored simultaneously. |
| Databáze: | OpenAIRE |
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