Deposition of Titania-containing Diamond-like Carbon Nanocomposite Films by Sputtering-assisted Chemical Vapor Deposition

Autor: Franklin Chau-Nan Hong, Yeau-Ren Jeng, Kuo Cheng Chen
Rok vydání: 2011
Předmět:
Zdroj: Plasma Processes and Polymers. 8:324-332
ISSN: 1612-8850
DOI: 10.1002/ppap.201000132
Popis: Titania-containing diamond-like carbon (DLC) nanocomposite films were prepared by sputtering-assisted plasma chemical vapor deposition. With titanium-oxygen species sputtered from titania (TiO 2 ) target by argon using a radio-frequency (RF) power, DLC films were simultaneously grown on the negatively-biased substrate by plasma chemical vapor deposition of acetylene gas using a pulsed direct-current (DC) power. By adjusting the Ar/acetylene gas concentration, both TiO 2 and TiC nanoparticles could be incorporated in the DLC films. TiO 2 nanoparticles were mainly formed in the DLC matrix with Ti―O bond being the dominant bonding for Ti in the DLC films. Furthermore, the amount of TiO 2 and TiC nanoparticles embedded in the DLC film increased with the increase of Ar concentration in the gas. The TiO 2 -DLC nanocomposite films deposited at 80% Ar exhibited a high hardness of around 13 GPa at a relatively low stress and, particularly, a fast rate of turning super-hydrophilic by reaching zero degree of water contact angle under 40 min of ultraviolet irradiation.
Databáze: OpenAIRE