Immersion patterning down to 27 nm half pitch

Autor: S. J. Deneault, Theodore H. Fedynyshyn, I. Pottebaum, Mordechai Rothschild, Theodore M. Bloomstein, M. F. Marchant
Rok vydání: 2006
Předmět:
Zdroj: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 24:2789
ISSN: 1071-1023
DOI: 10.1116/1.2366678
Popis: Liquid immersion interference lithography at 157nm has been used to print gratings of 27nm half pitch with a fluorine-doped fused silica prism having index of 1.66. In order to achieve these dimensions, new immersion fluids have been designed and synthesized. These are partially fluorinated organosiloxanes with indexes up to 1.5. Their absorbance is on the order of 0.4∕μm (base 10), enabling the use of liquid films with micron-size thickness. To utilize these semiabsorptive fluids, an immersion interference printer has been designed, built, and implemented for handling micron-scale liquid layers.
Databáze: OpenAIRE