Electrochemical Formation of Laminar Deposits of Controlled Structure and Composition: II . Dual Current Pulse Galvanostatic Technique
| Autor: | A. R. Despić, Vladimir D. Jović, S. Spaić |
|---|---|
| Rok vydání: | 1989 |
| Předmět: |
Renewable Energy
Sustainability and the Environment Chemistry Analytical chemistry Laminar flow engineering.material Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Metal Surface coating visual_art Phase (matter) Materials Chemistry Electrochemistry visual_art.visual_art_medium engineering Deposition (phase transition) Noble metal Dissolution Concentration polarization |
| Zdroj: | Journal of The Electrochemical Society. 136:1651-1657 |
| ISSN: | 1945-7111 0013-4651 |
| DOI: | 10.1149/1.2096987 |
| Popis: | A method of obtaining laminar metals by electrochemical deposition is described. It is based on a pulsating current regime, which provides total concentration polarization with respect to metal 1, as a prerequisite for simultaneous deposition of both metals. Equations are derived for thickness of both layers, as well as for the composition of the layer containing both metals. The regime was applied to two systems: copper‐lead and copper‐nickel, representing two extremes of total immiscibility and total miscibility in the solid phase, respectively. In the first system, the replacement reaction takes place, which leads to a virtual dissolution of the less noble metal during the off period. The kinetics of the replacement reaction are considered. |
| Databáze: | OpenAIRE |
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