Characteristics and potential applications of orbiting ultrahigh vacuum facilities

Autor:	Leonard T. Melfi
Rok vydání:	1977
Předmět:	Materials science Fabrication Materials processing Silicon Nuclear engineering Aerospace Engineering chemistry.chemical_element Nanotechnology Space manufacturing Chemical vapor deposition Ames Laboratory chemistry Shield Thin film
Zdroj:	Acta Astronautica. 4:801-812
ISSN:	0094-5765
DOI:	10.1016/0094-5765(77)90014-5
Popis:	The characteristics of an orbiting molecular shield ultrahigh vacuum facility are described and some examples of potential applications are discussed. Published results of a kinetic theory analysis are given. Densities within the shield of less than 103 molecules/cm3 can be obtained allowing high purity materials processing experiments to be performed in orbit under the simultaneous conditions of ultrahigh vacuum and microgravity. Two specific experiments are discussed: the production of ultrapure materials by the electrotransport technique developed at ERDA's Ames Laboratory, Iowa State University, and the vapor deposition and space preparation of silicon solar cells.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::41cd0c5458f7b2049b34c63720472efb https://doi.org/10.1016/0094-5765(77)90014-5 Zobrazit plný text záznamu