Microstructure and nanoindentation hardness of TiN/AlN multilayer films prepared by pulsed laser deposition
| Autor: | Guo Zhong Chai, P.H. Tang, J Mao, Renguo Song |
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| Rok vydání: | 2012 |
| Předmět: |
Materials science
Silicon Metallurgy chemistry.chemical_element Surfaces and Interfaces Nanoindentation Condensed Matter Physics Microstructure Nanocrystalline material Surfaces Coatings and Films Pulsed laser deposition Solid solution strengthening chemistry X-ray photoelectron spectroscopy Materials Chemistry Composite material Tin |
| Zdroj: | Surface Engineering. 28:165-170 |
| ISSN: | 1743-2944 0267-0844 |
| DOI: | 10.1179/026708410x12786785573238 |
| Popis: | TiN/AlN nanoscale multilayer films were deposited on silicon by pulsed laser depositions, with nominal periods of 10, 20, 40 and 100 nm and total thickness of the TiN/AlN multilayer of ∼500 nm. The microstructure, composition and period of samples were characterised by SEM, nanoindentation and friction tests. The SEM result indicates that the microstructure of the TiN/AlN multilayer film has a good period. The nanoindentation test shows that the hardness of the TiN/AlN multilayer films range from 22 to 30·6 GPa, which is higher than that of a single TiN film (17 GPa). The TiN/AlN multilayer film with a maximum hardness value of 30·6 GPa is associated with more effective combination of solid solution hardening (TiAlN) on the interface. This point is confirmed by X-ray photoelectron spectroscopy. The influences of the period on the microstructure and mechanical properties of films are also investigated. The X-ray diffraction patterns indicate that TiN film exhibits nanocrystalline columns, whereas A... |
| Databáze: | OpenAIRE |
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