Characteristics of UV confocal microscopy inspection for detecting 0.1 μm level defects

Autor: Chung Sam Jun, Sun Yong Choi, Sang Mun Chon, Sung Gon Ryu, Sang Bong Choi, Dong Chun Lee
Rok vydání: 2002
Předmět:
Zdroj: 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203).
DOI: 10.1109/issm.2001.962990
Popis: Due to shrinkage of design rule, optical in-line defect inspection with white-light source is reaching its detection limit. To overcome the limitation, a defect inspection system using UV confocal microscopy was recently introduced. In this paper, we investigated characteristics of UV confocal microscopy, which is confocal microscopy using UV light source, by analyzing TDI images captured by a defect inspection system with UV confocal microscopy. The results of this study showed that UV confocal microscopy has higher sensitivity and is more efficient for detection of 0.1 /spl mu/m-level small defects rather than white-light source or conventional microscopy.
Databáze: OpenAIRE