Projection mask-less lithography (PML2): First results from the multi beam blanking demonstrator
| Autor: | Christoph Brandstaetter, Ernst Haugeneder, Stefan Eder-Kapl, Hans-Joachim Doering, Helmut Langfischer, Martin Witt, Joerg Eichholz, Joachim Heinitz, Klaus Reimer |
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| Rok vydání: | 2006 |
| Předmět: |
Materials science
business.industry Condensed Matter Physics Chip Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Optics CMOS Cathode ray Miniaturization Electrical and Electronic Engineering business Lithography Maskless lithography Blanking Electronic circuit |
| Zdroj: | Microelectronic Engineering. 83:968-971 |
| ISSN: | 0167-9317 |
| Popis: | A proof-of-concept multi beam blanking device (''blanking demonstrator'') has been fabricated for the projection mask-less lithography project. It comprises a Si chip with approx. 4000 openings (each has a size of 8x8@mm^2) etched through with adjacent blanking electrodes fabricated by electroplating. The parameters of the blanking demonstrator such as electrode layout and density of openings are identical to the blanking device of the final production tool. The demonstrator is being tested within a dedicated broad beam electron beam teststand, which has proven to resolve |
| Databáze: | OpenAIRE |
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