Autor: E. I. Cherepov, E. G. Tishkovskii, Yu. N. Palyanov, Alexander G. Sokol, V. I. Obodnikov
Rok vydání: 2002
Předmět:
Zdroj: Russian Microelectronics. 31:277-281
ISSN: 1063-7397
DOI: 10.1023/a:1020230823633
Popis: The effect of isothermal annealing on the depth profiles of nitrogen atoms implanted into synthetic diamonds is studied by secondary-ion mass spectrometry. The annealing is performed under vacuum at 1400°C for 1, 5, or 20 h. It is found that the depth profile broadens on a macroscopic scale with annealing time. The broadening is successfully represented by a mathematical model of diffusion. The diffusion coefficient is roughly estimated at 2.3 × 10–15, 8.5 × 10–16, and 3.7 × 10–16 cm2/s for annealing times of 1, 5, and 20 h, respectively.
Databáze: OpenAIRE