Nano-scale focus control technology in electron beam wafer pattern inspection system

Autor:	宗明成 Zong Mingcheng, 郭 杰 Guo Jie, 赵 焱 Zhao Yan, 李世光 Li Shiguang
Rok vydání:	2019
Předmět:	Focus (computing) Materials science business.industry Cathode ray Optoelectronics Wafer business Nanoscopic scale Atomic and Molecular Physics and Optics
Zdroj:	Chinese Optics. 12:242-255
ISSN:	2095-1531
DOI:	10.3788/co.20191202.0242
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::40a0a8b56a420f078ed30e020ac43c86 https://doi.org/10.3788/co.20191202.0242 Zobrazit plný text záznamu