Two- and three-dimensional simulation analysis of microwave excited plasma for deposition applications: operation with argon at atmospheric pressure
| Autor: | F. Hempel, Detlef Loffhagen, Margarita Baeva, R. Foest, T Trautvetter, Hardy Baierl |
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| Rok vydání: | 2018 |
| Předmět: |
010302 applied physics
Materials science Argon Acoustics and Ultrasonics Atmospheric pressure chemistry.chemical_element Plasma Condensed Matter Physics 01 natural sciences 010305 fluids & plasmas Surfaces Coatings and Films Electronic Optical and Magnetic Materials Volumetric flow rate chemistry Excited state 0103 physical sciences Fluid dynamics Deposition (phase transition) Atomic physics Microwave |
| Zdroj: | Journal of Physics D: Applied Physics. 51:385202 |
| ISSN: | 1361-6463 0022-3727 |
| DOI: | 10.1088/1361-6463/aad537 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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