How Good Can Monolayer MoS2 Transistors Be?
| Autor: | Kartik Ganapathi, Youngki Yoon, Sayeef Salahuddin |
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| Rok vydání: | 2011 |
| Předmět: |
Materials science
business.industry Band gap Mechanical Engineering Transistor Bioengineering Nanotechnology General Chemistry Condensed Matter Physics law.invention Semiconductor Effective mass (solid-state physics) law Monolayer Optoelectronics General Materials Science Direct and indirect band gaps Field-effect transistor Electronics business |
| Zdroj: | Nano Letters. 11:3768-3773 |
| ISSN: | 1530-6992 1530-6984 |
| Popis: | Monolayer molybdenum disulfide (MoS2), unlike its bulk form, is a direct band gap semiconductor with a band gap of 1.8 eV. Recently, field-effect transistors have been demonstrated experimentally using a mechanically exfoliated MoS2 monolayer, showing promising potential for next generation electronics. Here we project the ultimate performance limit of MoS2 transistors by using nonequilibrium Green’s function based quantum transport simulations. Our simulation results show that the strength of MoS2 transistors lies in large ON–OFF current ratio (>1010), immunity to short channel effects (drain-induced barrier lowering ∼10 mV/V), and abrupt switching (subthreshold swing as low as 60 mV/decade). Our comparison of monolayer MoS2 transistors to the state-of-the-art III–V materials based transistors, reveals that while MoS2 transistors may not be ideal for high-performance applications due to heavier electron effective mass (m* = 0.45m0) and a lower mobility, they can be an attractive alternative for low power... |
| Databáze: | OpenAIRE |
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