Impact of Additional Pt on Channel Stress Induced by NiSi Film Formation

Autor:	Yukinori Hirose, H. Kimura, Nobuyoshi Hattori, Shuichi Kudo, M. Mizuo, Junichi Tsuchimoto, Tadashi Yamaguchi
Rok vydání:	2013
Předmět:	Materials science business.industry Stress induced Optoelectronics Nanotechnology business Communication channel
Zdroj:	Extended Abstracts of the 2013 International Conference on Solid State Devices and Materials.
DOI:	10.7567/ssdm.2013.b-1-4
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::4072c8a1262bdc79b0c1ef888c4265ce https://doi.org/10.7567/ssdm.2013.b-1-4 Zobrazit plný text záznamu