The effect of germane variation on microstructure in polycrystalline Si/Si 1-x Ge x thin films grown by rapid thermal chemical vapour deposition: fractal characterisation using scanning probe microscopy
| Autor: | P.A. Campbell, D.G. Walmsley, R.L.F. Chong, D. Gay, H.S. Gamble, D.W. McNeill |
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| Rok vydání: | 1998 |
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| Zdroj: | Applied Physics A: Materials Science & Processing. 66:S1067-S1071 |
| ISSN: | 1432-0630 0947-8396 |
| DOI: | 10.1007/s003390051299 |
| Databáze: | OpenAIRE |
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