| Popis: |
A series of experiments to demonstrate the feasibility of the EBAL (electron‐beam array lithography) concept is described, using a system of electron optics that deflects the electron beam in two stages: coarse and fine deflection. The field of view is divided up into a mosaic of smaller fields, called lenslets. It is required to stitch the lenslet fields into a complete, coherent field. A stitching theory is used [Singhal et al. (to be published)], together with a calibration plate. This procedure is demonstrated using two techniques: test patterns on resist are written and developed for examination by microscope; also electronic stitching is done, wherein test fiducial marks at lenslet boundaries are located with the electron beam, and data from adjacent lenslets are compared. This technique gives quantitative results more directly than writing on resist. We present results on 3×3 lenslet resist stitching to an accuracy of 0.2 μm, and 5×5 lenslet electronic stitching to 0.14 μm, which help to demonstrat... |
