Align-and-shine photolithography
| Autor: | Kristen Smith, Audrius Petrusis, Sven de Man, J.H. Rector, Davide Iannuzzi |
|---|---|
| Rok vydání: | 2009 |
| Předmět: |
010302 applied physics
Microelectromechanical systems Cantilever Optical fiber Fabrication Materials science Computational lithography Nanotechnology 02 engineering and technology 021001 nanoscience & nanotechnology 01 natural sciences law.invention Machining law 0103 physical sciences Microtechnology Photolithography 0210 nano-technology |
| Zdroj: | SPIE Proceedings. |
| ISSN: | 0277-786X |
| DOI: | 10.1117/12.834240 |
| Popis: | At the beginning of 2009, our group has introduced a new technique that allows fabrication of photolithographic patterns on the cleaved end of an optical fibre: the align-and-shine photolithography technique (see A. Petrusis et al., "The align-and-shine technique for series production of photolithography patterns on optical fibres", J. Micromech. Microeng. 19, 047001, 2009). Align-and-shine photolithography combines standard optical lithography with imagebased active fibre alignment processes. The technique adapts well to series production, opening the way to batch fabrication of fibre-top devices (D. Iannuzzi et al., "Monolithic fibre-top cantilever for critical environments and standard applications", Appl. Phys. Lett. 88, 053501, 2006) and all other devices that rely on suitable machining of engineered parts on the tip of a fibre. In this paper we review our results and briefly discuss its potential applications. |
| Databáze: | OpenAIRE |
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