Multiscale Simulation of the Development Process in Electron Beam Lithography
| Autor: | Hiroaki Kawata, Yoshihiko Hirai, Sho Hitomi, Masaaki Yasuda |
|---|---|
| Rok vydání: | 2017 |
| Předmět: |
Materials science
Polymers and Plastics business.industry Organic Chemistry Monte Carlo method Process (computing) 02 engineering and technology 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences 0104 chemical sciences Materials Chemistry Optoelectronics Stencil lithography 0210 nano-technology business Electron-beam lithography |
| Zdroj: | Journal of Photopolymer Science and Technology. 30:205-209 |
| ISSN: | 1349-6336 0914-9244 |
| DOI: | 10.2494/photopolymer.30.205 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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