Challenges and Progress in Defectivity for Advanced ArF Lithography Process

Autor:	Akinori Shibuya, Hidenori Takahashi, Marumo Kazuhiro, Mitsuhiro Fujita, Keiyu O, Takada Akira, Tango Naohiro, Kei Yamamoto, Toru Fujimori
Rok vydání:	2018
Předmět:	010309 optics Materials science Polymers and Plastics 0103 physical sciences Organic Chemistry Materials Chemistry Nanotechnology 02 engineering and technology Lithography process 021001 nanoscience & nanotechnology 0210 nano-technology 01 natural sciences
Zdroj:	Journal of Photopolymer Science and Technology. 31:555-558
ISSN:	1349-6336 0914-9244
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::3f858aebfe8276db225fe2d6db857ede https://doi.org/10.2494/photopolymer.31.555 Zobrazit plný text záznamu