| Popis: |
By analyzing the relation among different slit bar design of mask,TFT channel profile and electric characteristic,it's found that the TFT electric characteristic,ripple size and channel FICD bias are becoming better while slit or bar size decreases.The slit size has greater influence than bar size on TFT characteristic.Considering the ratio of short in the corner of channel,the small slit bar design is suitable for four mask processing,and the corner defect can be avoided by tuning bar size. |
