Improved stability of titanium based boron-doped chemical vapor deposited diamond thin-film electrode by modifying titanium substrate surface
| Autor: | Shu-Ting Chou, P.L. Hsu, P. Y. Lim, Fang Yin Lin, Han C. Shih, Yu. V. Pleskov, V. P. Varnin, V. G. Ralchenko, S.F. Hsu |
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| Rok vydání: | 2008 |
| Předmět: |
Materials science
Synthetic diamond Metallurgy Metals and Alloys Nucleation chemistry.chemical_element Diamond Surfaces and Interfaces Chemical vapor deposition engineering.material Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention chemistry Chemical engineering law Electrode Materials Chemistry engineering Thin film Boron Titanium |
| Zdroj: | Thin Solid Films. 516:6125-6132 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2007.11.016 |
| Popis: | The film quality and electrochemical properties of BDD (boron-doped diamond) thin films grown by hot-filament chemical vapor deposition technique on titanium substrates that had been subjected to a range of pre-treatment processes were evaluated. The pre-roughened Ti-substrates are shown to support more adherent BDD films. It is evident that acid-etching the Ti-substrate involves surface hydrogenation that enhances nucleation and formation of diamond thereon. The prepared BDD film exhibits wide potential window and electrochemical reversibility. It also demonstrated a better long-term electrochemical stability based on the low variation in voltametric background current upon the exposing of the electrodes to repeated cycles of electrochemical metal deposition/stripping process. |
| Databáze: | OpenAIRE |
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