Atmospheric Pressure Process for Coating Particles Using Atomic Layer Deposition

Autor: Erik M. Kelder, Ugo Lafont, Renske Beetstra, John Nijenhuis, J. Ruud van Ommen
Rok vydání: 2009
Předmět:
Zdroj: Chemical Vapor Deposition. 15:227-233
ISSN: 1521-3862
0948-1907
DOI: 10.1002/cvde.200906775
Popis: Atomic layer deposition (ALD) is a promising technique for coating micrometer- and nanometer-sized particles. Due to the self-terminating nature of the ALD half-reactions, the coating thickness can be controlled to the atomic level by choosing the number of cycles in which the half-reactions are repeated. This technique is performed in a fluidized bed reactor, under atmospheric pressure. LiMn2O4 particles (primary particles 200 − 500 nm in diameter) are coated with Al2O3 to various thicknesses, ranging from 5 ALD cycles to 28 ALD cycles. The resulting coatings are homogeneous, and the individual particles are coated, rather than the agglomerates as a whole; however there are indications of some build-up of water -mainly in pores- that may be related to the use of atmospheric pressure. Quantitative characterization of the coating is difficult due to the powdered substrate.
Databáze: OpenAIRE
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