Influence of the Halide Ion on the A-Site Dynamics in FAPbX3 (X = Br and Cl)

Autor:	V. K. Sharma, R. Mukhopadhyay, A. Mohanty, V. García Sakai, M. Tyagi, D. D. Sarma
Rok vydání:	2022
Předmět:	General Energy Physical and Theoretical Chemistry Surfaces Coatings and Films Electronic Optical and Magnetic Materials
Zdroj:	The Journal of Physical Chemistry C. 126:7158-7168
ISSN:	1932-7455 1932-7447
DOI:	10.1021/acs.jpcc.2c00968
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::3ef77630bab1aa1771d7c49c0e7c063d https://doi.org/10.1021/acs.jpcc.2c00968 Zobrazit plný text záznamu