Image quality compensation via tolerance sensitivity matrix method in lithography

Autor:	Chao Yang, Xianchang Zhu, Jing Chuan, Xiaolong Cheng, Haifeng Sun, Song Hu
Rok vydání:	2021
Zdroj:	10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced and Extreme Micro-Nano Manufacturing Technologies.
DOI:	10.1117/12.2626166
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::3ef497e2a002afac3a35a210d71e518a https://doi.org/10.1117/12.2626166 Zobrazit plný text záznamu