| Autor: |
Brian G. Rennex, Jay F. Marchiando, Joseph J. Kopanski, John Albers |
| Rok vydání: |
1998 |
| Předmět: |
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| Zdroj: |
The 1998 international conference on characterization and metrology for ULSI technology. |
| DOI: |
10.1063/1.56858 |
| Popis: |
Scanning capacitance microscope (SCM) image contrast measured on ion implanted P+/P and P+/N junction structures with identical dopant profiles, as a function of SCM operating conditions, is compared to a theoretical model of the SCM based on a two-dimensional finite-element solution of Poisson’s equation. Measured ΔC/ΔV versus bias voltage curves were found to agree with the theoretical model. For the P+/P structure, the lateral dopant profile is extracted using the model and compared to a Monte-Carlo simulation of the implanted profile. The image contrast of the P+/N junction structure and the dependence of the apparent junction location on SCM bias voltage is compared to model predictions calculated using the known dopant profile. The SCM quiescent operating point where the apparent junction location in an SCM image and the actual metallurgical p-n junction coincide is defined. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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