| Autor: |
Yukiko Kikuchi, Shigehisa Ohki, S. Tsuboi, M. Ezaki, T. Matsuda, Yoshinori Nakayama, T. Morosawa, Hiroshi Watanabe, H. Aoyama |
| Rok vydání: |
2002 |
| Předmět: |
|
| Zdroj: |
Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387). |
| DOI: |
10.1109/imnc.2000.872620 |
| Popis: |
E-beam mask writer is an extremely important tool to fabricate the x-ray mask. E-beam writing process is required to have enough placement accuracy and CD controllability for 1X mask. A variable-shaped 100 kV e-beam mask writer EB-X3 has been developed for x-ray membrane mask fabrication and evaluated by using commercially available positive tone resists. We have shown that the high resolution of 50 nm L/S could be obtained for ZEP-520 resists by using the stable 100 kV EB writer. In this study we focus on the chemically amplified (CA) resists for x-ray membrane mask fabrication. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
|
