Resistivity and Hall effect of copper films before and after adsorption of carbon monoxide
| Autor: | G. Wedler, W. Wiebauer |
|---|---|
| Rok vydání: | 1975 |
| Předmět: |
Condensed matter physics
Chemistry Scattering education Metals and Alloys chemistry.chemical_element Surfaces and Interfaces Copper Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry.chemical_compound Adsorption Electrical resistivity and conductivity Hall effect Materials Chemistry Molecule Anisotropy psychological phenomena and processes Carbon monoxide |
| Zdroj: | Thin Solid Films. 28:65-81 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/0040-6090(75)90276-x |
| Popis: | The dependence of the resistivity and the Hall effect of copper films on the method of film preparation and the film thickness has been studied before and after adsorption of carbon monoxide. It is shown that the Fuchs-Sondheimer theory does not adequately predict the dependence of resistivity on film thickness, because thickness-dependent disorder must be considered. It is further shown in the discussion of the Hall effect that scattering anisotropy must be taken into account. The influence of the adsorbed carbon monoxide on the resistivity and Hall coefficient can be ascribed to the scattering effect at the adsorbed molecules. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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