Temperature and thickness dependence of coercivity and magnetization of Co/Cu and Co/Si multilayers

Autor:	Z.S. Shan, John A. Woollam, David J. Sellmyer, S. Nafis
Rok vydání:	1991
Předmět:	Diffusion layer Magnetization Thin layers Materials science Nuclear magnetic resonance Analytical chemistry General Physics and Astronomy Substrate (electronics) Coercivity Sputter deposition Layer (electronics) Superparamagnetism
Zdroj:	Journal of Applied Physics. 70:6050-6052
ISSN:	1089-7550 0021-8979
DOI:	10.1063/1.350042
Popis:	Co/Cu and Co/Si multilayers of total thickness ∼3000 A were prepared by rf and dc magnetron sputtering. The nominal thicknesses of the individual layers were in the range of 4 to 100 A. A large coercivity (Hc) at 10 K was observed for very thin layers of Co in Co/Cu samples, and it decreased with increase of the Co layer thickness. For very thin layers of Co in Co/Cu samples, the layer behaved superparamagnetically. Similar behavior was not to be observed in Co/Si samples. With increased substrate temperature (Ts) during deposition, Hc was also observed to increase (decrease) for Co/Cu (Co/Si) samples. Magnetization data were modeled to determine the diffusion layer thicknesses.
Databáze:	OpenAIRE
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