| Autor: |
Hartmut Runge, Hartmut Dr Boroffka, Eberhard F Dr Krimmel |
| Rok vydání: |
1973 |
| Předmět: |
|
| Zdroj: |
Nuclear Instruments and Methods. 107:251-252 |
| ISSN: |
0029-554X |
| DOI: |
10.1016/0029-554x(73)90237-1 |
| Popis: |
A method to reduce the time to change dopants in ion implantation systems is described. The source is fed by a suitable mixture of dopant compounds and the desired dopant is selected by mass separation. The down time thus reduces to less than one minute. The main ion optical parameters of the system remain unchanged. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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