Dynamic Modeling Analysis for Control of Chemical Vapor Deposition

Autor:	M. Bufano, M. Toledo-Quiñones, Michael Gevelber
Rok vydání:	1998
Předmět:	Steady state Mechanical Engineering Control engineering Chemical vapor deposition Mechanics Nonlinear control Control volume Computer Science Applications System dynamics Nonlinear system Control and Systems Engineering Control system Process control Instrumentation Information Systems
Zdroj:	Journal of Dynamic Systems, Measurement, and Control. 120:164-169
ISSN:	1528-9028 0022-0434
DOI:	10.1115/1.2802405
Popis:	A nonlinear dynamic model of the chemical vapor deposition (CVD) process has been developed to aid design of a closed-loop control system. A lumped control volume analysis is used to capture important mass and fluid transients and spatial affects, while a simplified single variable equation is used to represent the complex reaction chemistry. Steady-state experimental results and model predictions are compared and the control implications of the process dynamics are discussed.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::3e1c26200a56c359c6cf82cdaaaf12b7 https://doi.org/10.1115/1.2802405 Zobrazit plný text záznamu