Issues of laser plasma sources for soft x-ray projection lithography
| Autor: | Eric Louis, Frederik Bijkerk, F. Voβ, Yu.Ya. Platonov, Alexander V. Mitrofanov, A. van Honk, B. Nicolaus, L. A. Shmaenok, H. Frowein, R. Desor, Alexander P. Shevelko, M.J. van der Wiel |
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| Rok vydání: | 1994 |
| Předmět: |
Materials science
business.industry Energy conversion efficiency Buffer gas Plasma Condensed Matter Physics Excimer Laser Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention Optics law Electrical and Electronic Engineering Projection (set theory) business Lithography Layer (electronics) |
| Zdroj: | Microelectronic Engineering. 23:211-214 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/0167-9317(94)90139-2 |
| Popis: | Results of optimization of an excimer laser-induced plasma x-ray source for projection lithography in the range λ = 13–15 nm are reported. A conversion efficiency of >0.7% in 2% BW has been achieved with high-Z target materials. Two methods of reducing contamination of optical elements by target debris have been tested: usage of a thin target layer (for Ta 1 μm was found to be optimal) and of a heavy buffer gas. The effect of the use of Ta-tape target and Kr buffer gas has been measured by determining the reflectivity of a Mo-Si multilayer sample after 10 5 shots. |
| Databáze: | OpenAIRE |
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