| Autor: |
Takahashi Yuji, Makoto Sano, Masamitsu Shinozuka, Kazuyoshi Ueno, Miyuki Shiraishi, Mitsukuni Tsukihara, Tetsuya Kudo, Michiro Sugitani, Yasuhiko Kimura, Masazumi Koike, Hiroyuki Kariya, Fumiaki Sato, Sho Kawatsu, Yuji Ishida |
| Rok vydání: |
2012 |
| Předmět: |
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| Zdroj: |
AIP Conference Proceedings. |
| ISSN: |
0094-243X |
| DOI: |
10.1063/1.4766557 |
| Popis: |
The MC3-II/GP is a leading-edge single-wafer medium-current ion implanter, newly developed by SEN Corporation. It demonstrates exceptional productivity based on a high speed wafer-handling station and enhanced beam current. It covers a substantively wider energy range in order to fully meet advanced device requirements. Retaining the superior features of the MC3-II/WR, the MC3-II/GP provides a remarkable increase of multiply-charged beam current coupled with longer ion source lifetime. Another advanced feature of the MC3-II/GP is a 30 second or 14% reduction in auto beam setup time. These improvements enable a fabrication line to reduce the total number of ion implanters and dramatically reduce COO. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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