Autor: |
E. Bauser, Silke Christiansen, W. Dorsch, Martin Albrecht, Horst P. Strunk, P.O. Hansson |
Rok vydání: |
1995 |
Předmět: |
|
Zdroj: |
Surface Science. :896-901 |
ISSN: |
0039-6028 |
DOI: |
10.1016/0039-6028(95)00152-2 |
Popis: |
We investigate by atomic force microscopy the early growth stages of Ge 0.85 Si 0.15 grown by solution epitaxy on Si(001). The layers grow in the Stranski-Krastanov growth mode with facetted islands of pyramidal and, with further growth, truncated pyramidal shape. Finite element calculations of the strain fields within the islands at different growth stages yield an increasing strain energy density near the island basis edges. The effect of the increase in strain energy density is to limit the lateral growth, whereas the relaxed top regions enhance growth in height. |
Databáze: |
OpenAIRE |
Externí odkaz: |
|