The Formation of Hollow Lead Structures on the Surface of PbSe Films Treated in Argon Plasma
| Autor: | I. I. Amirov, K. E. Guseva, V. V. Naumov, S. P. Zimin |
|---|---|
| Rok vydání: | 2018 |
| Předmět: |
010302 applied physics
Argon Materials science Physics and Astronomy (miscellaneous) Scanning electron microscope Analytical chemistry chemistry.chemical_element 02 engineering and technology Plasma 021001 nanoscience & nanotechnology Threshold energy 01 natural sciences Semimetal Ion chemistry Sputtering 0103 physical sciences Inductively coupled plasma 0210 nano-technology |
| Zdroj: | Technical Physics Letters. 44:518-521 |
| ISSN: | 1090-6533 1063-7850 |
| DOI: | 10.1134/s1063785018060305 |
| Popis: | Conditions for ion sputtering of a PbSe/CaF2/Si(111) epitaxial system in high-density inductively coupled plasma of high-frequency low-pressure discharge in argon have been established that ensure the formation of submicron-sized hollow lead structures on a lead-selenide surface. The surface was plasma-treated for time periods within 60–240 s at low energy (20–30 eV) of Ar+ ions, which is close to their sputtering threshold energy. The properties of the obtained material were studied by the techniques of scanning electron microscopy and energy-dispersive X-ray microanalysis. It is shown that the characteristic size, shape, and density of surface structures can be varied within broad limits depending on the time of plasma treatment and temperature of the material surface. Physical processes responsible for the formation of hollow lead structures under the proposed conditions of plasma sputtering are considered. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|