Seven-inch large-size synthesis of monolayer hexagonal BN film by low-pressure CVD
| Autor: | Feipeng Sun, Junyong Kang, Abdul Majid Soomro, Huachun Wang, Chenping Wu, Xiaodong Yang, Chuan Liu, Duanjun Cai |
|---|---|
| Rok vydání: | 2015 |
| Předmět: |
Argon
Materials science Hydrogen chemistry.chemical_element Nanotechnology 02 engineering and technology Substrate (electronics) Chemical vapor deposition 010402 general chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences 0104 chemical sciences Electronic Optical and Magnetic Materials Characterization (materials science) chemistry Chemical engineering Monolayer Wafer 0210 nano-technology FOIL method |
| Zdroj: | physica status solidi (b). 253:829-833 |
| ISSN: | 0370-1972 |
| Popis: | We report the large-size synthesis of atomic monolayer hexagonal boron nitride (h-BN) film on flexible Cu foil by a low-pressure chemical vapor deposition (CVD) method. The borazane powder was used as the precursor carried by mixed hydrogen/argon gases. By rolling the Cu foil substrate into a cylindrical shape, wafer-scale monolayer h-BN film has been achieved at a size over 7 in. With the aid of PMMA, the h-BN monolayer was transferred onto a 4″ Si wafer for characterization and further electrical applications. This technique could be transferred to thin-film growth on any flexible substrates. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Plný text