XPS analysis of nano-thin films on substrate

Autor:	K. Tökési, S. F. Mao, A. Csik, R. J. Bereczky, Z. M. Zhang, József Tóth, Zhiguo Ding
Rok vydání:	2008
Předmět:	Materials science Analytical chemistry Surfaces and Interfaces General Chemistry Substrate (electronics) Condensed Matter Physics Signal Spectral line Surfaces Coatings and Films Overlayer X-ray photoelectron spectroscopy Nano Materials Chemistry Thin film Nanoscopic scale
Zdroj:	Surface and Interface Analysis. 40:728-730
ISSN:	1096-9918 0142-2421
DOI:	10.1002/sia.2800
Popis:	For a surface localized nano-structure, the XPS quantification based only on peak intensity analysis is inaccurate. In this work, we have developed an algorithm that is more elaborate and convenient for application to XPS quantification of nanoscale thin film on substrate by considering the background in a region of about 100eV following the film signal peak. A W/SiO 2 overlayer sample is investigated in this work. Theoretical evaluation of the spectra is compared with the experimental result and a pertinent algorithm is derived for application to the film thickness analysis.
Databáze:	OpenAIRE
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