Deposition of A1N thin films by magnetron reactive sputtering
| Autor: | K. I. Kirov, E.V. Gerova, N. Ivanov |
|---|---|
| Rok vydání: | 1981 |
| Předmět: |
Materials science
Silicon Annealing (metallurgy) Metals and Alloys chemistry.chemical_element Surfaces and Interfaces Sputter deposition Combustion chemical vapor deposition Surfaces Coatings and Films Electronic Optical and Magnetic Materials Chemical engineering chemistry Sputtering Aluminium Cavity magnetron Materials Chemistry Thin film |
| Zdroj: | Thin Solid Films. 81:201-206 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/0040-6090(81)90482-x |
| Popis: | A1N films were deposited onto silicon substrates in d.c. planar magnetron system by means of reactive sputtering of aluminium in an atmosphere of nitrogen. The influence of the deposition conditions and of post-deposition annealing on the properties of the insulator and the A1NSi interface were investigated. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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