Autor: |
S Ootomo, T Hirayama, H Sasaki, K. Yamamoto, Takeyoshi Matsuda |
Rok vydání: |
2008 |
Předmět: |
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Zdroj: |
Springer Proceedings in Physics ISBN: 9781402086144 |
DOI: |
10.1007/978-1-4020-8615-1_85 |
Popis: |
This paper describes a method to map dopant distributions in compound semiconductors by off-axis electron holography. A cross-sectional transmission electron microscopy (TEM) specimen with n+, n− and p gallium arsenide thin films was prepared using the micro-sampling technique of a focused ion beam and Ar+ ion milling. A phase map was obtained by off-axis phase-shifting electron holography, and the dopant distributions across a p–n junction are clearly observed. Furthermore, the low and high dopant concentration regions are remarkably distinguished with high contrast. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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