Study on the Mechanism of Nano-Flake Defect during Tungsten Contact Chemical Mechanical Polishing
| Autor: | Ja-Hyung Han, Bryan Egan, ManFai Ng, Chih-Chieh Huang, Adam Lawyer, Hong Jin Kim |
|---|---|
| Rok vydání: | 2018 |
| Předmět: |
010302 applied physics
Materials science Flake chemistry.chemical_element 02 engineering and technology Tungsten 021001 nanoscience & nanotechnology 01 natural sciences Electronic Optical and Magnetic Materials chemistry Chemical-mechanical planarization 0103 physical sciences Nano Composite material 0210 nano-technology Mechanism (sociology) |
| Zdroj: | ECS Journal of Solid State Science and Technology. 7:P175-P179 |
| ISSN: | 2162-8777 2162-8769 |
| DOI: | 10.1149/2.0111804jss |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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