Si/Si0.7Ge0.3 A2RAM nanowires fabrication and characterization for 1T-DRAM applications

Autor: X. Mescot, F. Tcheme Wakam, C. Vizioz, F. Aussenac, J.M. Hartmann, Kyung Hwa Lee, Joris Lacord, M. Bawedin, L. Brevard, Pascal Besson, Zdenek Chalupa, Virginie Loup
Rok vydání: 2021
Předmět:
Zdroj: 2021 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EuroSOI-ULIS).
DOI: 10.1109/eurosoi-ulis53016.2021.9560676
Popis: A2RAM devices are fabricated using an adaptation of Si-Nanowire process flow. They include a Si-SiGe heterostructure to improve memory performance. Even the device structure is not exactly what we expect, we succeed to evidence 1T-DRAM programming.
Databáze: OpenAIRE