A time- and angle-resolved X-ray photoelectron spectroscopy study of polystyrene exposed to a nitrogen plasma
| Autor: | H. Benalia, R.W. Paynter |
|---|---|
| Rok vydání: | 2004 |
| Předmět: |
Radiation
Materials science Spectrometer Analytical chemistry chemistry.chemical_element Condensed Matter Physics Nitrogen Oxygen Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials chemistry.chemical_compound Polymer degradation chemistry X-ray photoelectron spectroscopy Limiting oxygen concentration Polystyrene Irradiation Physical and Theoretical Chemistry Spectroscopy |
| Zdroj: | Journal of Electron Spectroscopy and Related Phenomena. 136:209-220 |
| ISSN: | 0368-2048 |
| DOI: | 10.1016/j.elspec.2004.04.002 |
| Popis: | Angle-resolved X-ray photoelectron spectroscopy (ARXPS) measurements were made on a polystyrene sample that had been exposed to a nitrogen plasma. It was observed that both oxygen and nitrogen were present in the sample surface, and that both were lost over a period of 5 h under X-ray irradiation in the vacuum of the spectrometer. The ARXPS data sets were corrected for the time displacement between consecutive measurements at different photoemission angles, and fitted with boxcar models in order to extract simple nitrogen and oxygen concentration depth profiles, consistent with the data, as a function of time. Both depth profiles were found to evolve in a consistent manner, indicating a loss of both the average concentration and thickness in the oxygen profile, and a stable concentration but similar loss of thickness in the nitrogen profile. |
| Databáze: | OpenAIRE |
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