Hydrogen radical treatment for surface oxide removal from copper

Autor:	Eiji Higurashi, Seongbin Shin, Kohta Furuyama, Tadatomo Suga
Rok vydání:	2017
Předmět:	Argon Ion beam Hydrogen Inorganic chemistry Oxide chemistry.chemical_element Copper Condensed Matter::Materials Science Atomic layer deposition chemistry.chemical_compound chemistry X-ray photoelectron spectroscopy Physics::Chemical Physics Layer (electronics)
Zdroj:	2017 5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D).
DOI:	10.23919/ltb-3d.2017.7947468
Popis:	Hydrogen radicals were used to remove the oxide layer of copper metal. Successful removal of the oxide layer was detected using X-ray photoelectron spectroscopy (XPS), where the visible color change has occurred after the treatment. Period of re-oxidization was further analyzed which then was compared to argon ion beam and fast atom beam (FAB) treatment. The approach has introduced a highly promising technique to remove oxide layers of metals.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::3cd0091e62f24f245175053b74c58f5c https://doi.org/10.23919/ltb-3d.2017.7947468 Zobrazit plný text záznamu