1064 nm Laser Conditioning Effect of HfO2/SiO2High Reflectors Deposited by E-Beam

Autor:	赵元安 Zhao Yuan’an, 李笑 Li Xiao, 李大伟 Li Dawei, 邵建达 Shao Jianda, 刘晓凤 Liu Xiaofeng
Rok vydání:	2009
Předmět:	Materials science Optics law business.industry Electron beam processing Conditioning Electrical and Electronic Engineering Laser business Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials law.invention
Zdroj:	Chinese Journal of Lasers. 36:1545-1549
ISSN:	0258-7025
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::3cc5cceb39825b3963046496ac76bea7 https://doi.org/10.3788/cjl20093606.1545 Zobrazit plný text záznamu