| Autor: |
Tom Cecil, Chang-Jin Kang, Hyun-Jong Lee, Junghoon Ser, Christopher Ashton, David Kim, Xin Zhou, Guangming Xiao, Sung-Gon Jung, Donghwan Son, Seong-Woon Choi, Woojoo Sim, David Irby, Sungsoo Suh |
| Rok vydání: |
2011 |
| Předmět: |
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| Zdroj: |
SPIE Proceedings. |
| ISSN: |
0277-786X |
| Popis: |
For low k1 lithography the resolution of critical patterns on large designs can require advanced resolution enhancement techniques for masks including scattering bars, complicated mask edge segmentation and placement, etc. Often only a portion of a large layout will need this sophisticated mask design (the hotspot), with the remainder of layout being relatively simple for OPC methods to correct. In this paper we show how inverse lithography technology (ILT) can be used to correct selected regions of a large design after standard OPC has been used to correct the simple portions of the layout. The hotspot approach allows a computationally intensive ILT to be used in a limited way to correct the most difficult portions of a design. We will discuss the most important issues such as: model matching between ILT and OPC corrections; transition region corrections near the ILT and OPC boundary region; mask complexity; total combined runtime. We will show both simulated and actual wafer lithographic improvements in the hotspot regions. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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