Electron‐spin‐resonance evidence for an impurity‐relatedE’‐like hole trapping defect in thermally grown SiO2on Si

Autor: H. L. Evans, John F. Conley, Patrick M. Lenahan, R. K. Lowry, T. J. Morthorst
Rok vydání: 1994
Předmět:
Zdroj: Journal of Applied Physics. 76:8186-8188
ISSN: 1089-7550
0021-8979
DOI: 10.1063/1.357871
Popis: Using electron spin resonance (ESR), a new electrically active point defect in thermally grown SiO2 films on Si has been detected. The defect has a large capture cross section for electrons when it is paramagnetic and holes when it is diamagnetic (ESR inactive). The g‐tensor values, symmetry, and microwave power saturation characteristics are all similar to those of the well‐known E’ family of amorphous SiO2 defect centers.
Databáze: OpenAIRE