Electrochemical behaviour of uncoated and phosphatidylcholine coated copper in hydrochloric acid medium
| Autor: | Shipra Mukhopadhyay, Priyabrata Banerjee, Dipankar Sukul, Sourav Kr. Saha, Aparesh Pal |
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| Rok vydání: | 2018 |
| Předmět: |
Inorganic chemistry
chemistry.chemical_element Hydrochloric acid 02 engineering and technology engineering.material 010402 general chemistry Electrochemistry 01 natural sciences Corrosion chemistry.chemical_compound Adsorption Coating Phosphatidylcholine Materials Chemistry Physical and Theoretical Chemistry Fourier transform infrared spectroscopy Spectroscopy Chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics Copper Atomic and Molecular Physics and Optics 0104 chemical sciences Electronic Optical and Magnetic Materials engineering 0210 nano-technology |
| Zdroj: | Journal of Molecular Liquids. 249:930-940 |
| ISSN: | 0167-7322 |
| DOI: | 10.1016/j.molliq.2017.11.129 |
| Popis: | Electrochemical reactions occurring at the copper-aqueous hydrochloric acid interface and efficacy of phosphatidylcholine coating towards retarding the rate of these reactions are been assessed through potentiodynamic polarization and electrochemical impedance spectroscopic methods. Phosphatidylcholine coating retards the rate of both cathodic and anodic reactions at the metal-electrolyte interface and maintains high degree of corrosion inhibition efficiency for copper in hydrochloric acid with 0.5 M to 2 M concentration up to 96 h of exposure time. Mode of adsorption of phosphatidylcholine molecule on copper surface in acid medium is explained from FTIR spectroscopic data and corroborated with quantum chemical results. |
| Databáze: | OpenAIRE |
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