Study on the thermoelectric properties of Al-ZnO thin-film stack fabricated by physical vapour deposition process for temperature sensing
| Autor: | K. Shifana Lourdes, K.R. Gunasekhar, Sanjay John, Sanath Kumar Honnali, Ganapathy Saravanavel |
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| Rok vydání: | 2021 |
| Předmět: |
Materials science
Metals and Alloys Substrate (electronics) Atmospheric temperature range Sputter deposition Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Stack (abstract data type) Thermocouple Thermoelectric effect Deposition (phase transition) Electrical and Electronic Engineering Composite material Thin film Instrumentation |
| Zdroj: | Sensors and Actuators A: Physical. 332:113097 |
| ISSN: | 0924-4247 |
| DOI: | 10.1016/j.sna.2021.113097 |
| Popis: | In this work, Al-ZnO thin-film stacks were fabricated by the physical vapour deposition (PVD) process. ZnO films with different oxygen compositions were deposited by reactive DC magnetron sputtering. According to the results, it was observed that the deposition parameters influenced the thin film’s thermoelectric properties. The thermoemf response of the Al-ZnO stacks was studied through experiments to calibrate the same as a thin-film thermocouple (TFTC). The best linear response was observed for the stack with ZnO having an oxygen composition of 80.45% for temperatures between 360 K and 400 K. The stack showed a sensitivity of 5.22 mV/K and 0.78 mV/K, in the same temperature range, on the glass substrate and the sucrose substrate, respectively. A comparative study of the thermoemf response was carried out between Al-ZnO and Al-Ag stacks on glass and sucrose substrates, and wired thermocouples. |
| Databáze: | OpenAIRE |
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