Properties of a-Si1-xCx:H alloys deposited in the hot-plasma - Box glow discharge reactor
| Autor: | D.M. Bhusari, R.O. Dusane, S.T. Kshirsagar |
|---|---|
| Rok vydání: | 1991 |
| Předmět: |
Glow discharge
Materials science Alloy Metallurgy technology industry and agriculture Analytical chemistry Plasma engineering.material equipment and supplies Condensed Matter Physics Parallel plate Electronic Optical and Magnetic Materials Materials Chemistry Ceramics and Composites engineering Deposition (chemistry) |
| Zdroj: | Journal of Non-Crystalline Solids. :689-692 |
| ISSN: | 0022-3093 |
| DOI: | 10.1016/s0022-3093(05)80214-5 |
| Popis: | The structural, electrical and optical properties of the a-Si:C:H alloy films grown with high deposition rates in the Hot Plasma Box (HPB) glow discharge reactor are reported. The electronic quality of these alloys is found to be equally good as that of grown with low deposition rates in the conventional open parallel plate glow discharge reactor. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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