| Popis: |
In soak and spike anneal process, applied materials vantage family tools are widely used in 28/40nm and beyond. The domestic machines of this kind, being still on the stage of development, have a great potentiality in the semiconductor industry. As a domestic vendor, Mattson has introduced Helios XP for rapid thermal process(RTP).In this paper, the temperature profiles about soak anneal process have been collected on Mattson Helios XP. Besides, sheet resistance, oxide thickness, device data and yield also have been investigated both on blanket wafer and pattern wafer. The result shows that the performances of Mattson Helios XP are comparable with applied materials' vantage tool. Therefore, Helios XP as domestic machine can be applied in soak anneal at 28/40nm node for the large-scale industrial production. |
