Self-aligned single-exposure deep x-ray lithography

Autor:	M. Boerner, V.P. Nazmov, E.F. Reznikova, B.G. Goldenberg
Rok vydání:	2020
Předmět:	Materials science Single exposure business.industry Optoelectronics X-ray lithography business Lithography
Zdroj:	SYNCHROTRON AND FREE ELECTRON LASER RADIATION: Generation and Application (SFR-2020).
ISSN:	0094-243X
Popis:	The method of deep X-ray lithography has been developed, which allows the formation of self-aligned microstructures. Examples of microstructures are presented.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::3ab05daf135bfa496d3dc3df3fd3ac6a https://doi.org/10.1063/5.0030469 Zobrazit plný text záznamu